Chemical Vapor Deposition (CVD)
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Product Information
| ISBN | 9781536199499 |
|---|---|
| Publisher | Nova Science Publishers Inc |
| Publishing Date | 17/08/2021 |
| Price (excl. tax) | €178.21 |
| Tax | €10.69 |
| Price (incl. tax) | €188.90 |
| Availability | 1 unit in external warehouse |
Product Description
Chemical vapor deposition (CVD) refers to a vacuum deposition method used to produce high quality, high-performance, solid materials in a variety of manufacturing industries. Chapter One provides a critical review of published experimental data for thin films of silicon nitride deposited by thermal and plasma CVD, plasma CVD, high density plasma CVD, atomic layer-by-layer deposition, and hot-wire CVD. Chapter Two describes several aspects of the use of CVD for single-crystal diamond synthesis for electronics. Chapter Three describes the properties of graphene and its preparation by a number of methods with a focus on the classical CVD method on copper foil together with graphene transfer onto a dielectric substrate.